Perovskite Cell Crystallization Oven

The automatic crystallization oven is mainly used for the drying and crystallization annealing processes after perovskite thin film coating. By precisely controlling parameters such as temperature, atmosphere, and heating rate, it enables rapid and directional solvent removal, promotes the formation of uniform and dense high-quality crystalline structures in perovskite thin films, and lays a foundation for high-efficiency photoelectric conversion of solar cells. This intelligent automatic oven is specifically designed according to the characteristics of perovskite crystallization processes, enabling precise multi-dimensional parameter control.

Core Advantages 

• Precise      Thermal Field Control:Infrared heating combined with an intelligent      temperature control system is adopted. Temperature field uniformity      reaches ±2°C, with a maximum heating rate of 50°C/min. Multi-stage      temperature profile programming is supported to accurately match the      crystallization process requirements of different perovskite material compositions. 

• Flexible      Atmosphere Control:Supports switching among various protective atmospheres      such as air, nitrogen, and argon, with atmosphere purity up to 99.999%.      Equipped with a high-pre

• cision flow control system, it enables accurate      adjustment of gas flow rate and pressure according to process      requirements, preventing film oxidation and improving crystallization quality. 

• Intelligent      and Efficient Operation:Adopts a PLC + touchscreen intelligent control      system, supporting process parameter storage, retrieval, and traceability.      Equipped with an automatic loading and unloading mechanism, it can      seamlessly integrate with upstream and downstream equipment to realize      automated continuous production, significatly improving production      efficiency and reducing manual intervention.

 Safe  and Stable Design:Built-in multiple safety protections such as      over-temperature alarm, overcurrent protection, and atmosphere leakage      detection. The chamber is made of corrosion-resistant and high-temperature-resistant materials to ensure long-term stable operation      and extended service life.

Key Parameters 

• Temperature Range: Room temperature to 300°C (expandable to 500°C)
• Temperature Uniformity: ±1°C
• Heating Rate: 0.1–50°C/s (adjustable)
• Effective Chamber Size: Customizable according to customer production capacity      requirements
• Protective Atmosphere: Air, nitrogen, argon, etc. (optional)

Functions 

Designed for the drying process requirements of perovskite thin films, this system utilizes infrared heating and precise temperature control to achieve rapid and uniform drying of wet perovskite films, improve film crystallization quality, reduce film defects, and ensure stable photoelectric performance. Both atmospheric and vacuum types are available to suit different process scenarios. 

Technical Advantages 

Precise Temperature Control:Utilizes multi-zone temperature sensors and intelligent temperature control algorithms. The atmospheric type reaches 140°C in only 55 seconds with temperature accuracy of ±3°C; the vacuum type enables rapid heating to 80°C with temperature accuracy of ±7°C, ensuring overall temperature uniformity.

High-Efficiency Drying Design:The atmospheric type uses a crank–connecting rod mechanism to drive reciprocating carrier movement, while the vacuum type combines rapid infrared heating with a high-vacuum environment, significantly reducing film defects and improving product consistency.

Safe Sealing Design:Fully sealed structure with dedicated gas inlet and exhaust channels, effectively removing volatile gases generated during the drying process to ensure operational safety and a clean environment.

Flexible Compatibility:Compatible with a wide range of substrate sizes from 300 mm × 400 mm to 1200 mm × 2400 mm. Heating power and drying cycles can be customized according to customer process requirements.

Parameters