he slot-die coating machine is a key core piece of equipment in the preparation of perovskite thin films. It directly determines the uniformity, density, and thickness accuracy of the film, thereby affecting the power conversion efficiency and long-term stability of the solar cell.
Core Advantages:
- Ultra-High Film Formation Precision:Dual closed-loop control using servo motors and grating rulers is adopted, combined with a high-precision coating die head and injection pump system. The control resolution reaches 0.01 μl with a response time of 0.01 s, enabling precise film thickness control from nanometer to micrometer scale (20 nm–150 μm). Coating uniformity deviation is as low as ±3%, ensuring consistent performance across large-area films.
- High-Efficiency Mass Production Capability: Supports customized coating widths and adapts to module production of various sizes. The coating speed can reach 2–200 mm/s. An integrated automatic liquid feeding, degassing, and cleaning system is provided, achieving material utilization up to 95%, significantly improving production throughput and reducing material loss costs.
- Wide Compatibility: Supports coating on rigid and flexible substrates such as glass, PET, and CPI. It is compatible with various perovskite precursor solutions and functional layer materials within a viscosity range of 1–2000 cps. Combined with multi-stage coating processes and multi-zone vacuum adsorption platforms, it meets the process requirements of different technical routes.
- Stable and Reliable Design:The coating platform adopts a marble base combined with an air-floating module structure, achieving platform flatness of ±1.5 μm, effectively avoiding vibration interference during coating. The coating die head is made of a dedicated alloy material with special surface heat treatment, offering excellent resistance to organic solvents and deformation. The long-term equipment uptime remains stable at over 98%.
Technical Parameters:
- Compatible substrates: Glass, PET, CPI, etc., thickness 2–10 mm
- Maximum coating size: Supports large-size substrates from 1200 mm × 600 mm up to 2.88 sqm (customizable)
- Coating speed: 2–200 mm/s (adjustable)
- Film thickness range: 20 nm–150 μm (wet thickness)
- Control system: Touchscreen and PLC intelligent control, supporting process parameter storage and recall
Core Functions
As the core “heart” equipment for perovskite thin film preparation, this slot-die coating machine precisely controls the relative motion between the coating die head and the substrate, uniformly coating functional materials such as perovskite precursor solutions onto the substrate surface at a preset thickness. It enables precise coating of multiple layers including the hole transport layer, perovskite active layer, and electron transport layer, and is compatible with various substrate types such as glass and flexible polymers.
Technical Advantages
- Ultra-High Film Formation Precision:Utilizing a self-developed high-precision air-floating motion platform and fluid-chamber coating blade, nanometer- to micrometer-level (20 nm–150 μm) film thickness control is achieved. Coating uniformity deviation is as low as ±3% (@400–500 nm), effectively eliminating edge effects and ensuring phase uniformity of large-area films.
- High Material Utilization Efficiency:Equipped with an intelligent metered pumping system and an enclosed coating environment, material utilization can exceed 95%, significantly reducing material loss and production costs.
- Full-Scenario Compatibility:Supports slurry coating within a wide viscosity range of 1–70 cp, compatible with laboratory-scale substrates of 300 mm × 400 mm up to mass-production substrates of 1200 mm × 2400 mm. Coating width can be customized according to customer requirements, meeting full-process needs from R&D to GW-scale mass production.
- Intelligent and Stable Control:Equipped with AI algorithms for real-time monitoring of coating defects, dynamically adjusting coating gap, flow rate, and substrate movement speed. Coating speed fluctuation is ≤0.5%, ensuring stable continuous production.
Key Parameters
Parameters | Lab-scale | Production-scale |
Substrate Size | 300mm×400mm (Customizable) | 1200mm×2400mm (Compatible with smaller sizes) |
Coating Uniformity | ≤±3% @400-500nm | ≤5% @300~600nm |
Slurry Viscosity Adaptation | 1~70cp | 1~70cp |
Cycle Time | - | 75s @60mm/s |
Equipment Power | 3kw | Customization |
Video : https://youtu.be/1pDuOKzuXK0?si=hUbYfpHipmykvF-8